BIONIKA DI UF, Multi-unit abutment, angled, positioned, wide, LT2, type-B Sulcus:s 1 mm ensuring durable and precise retention

ensuring durable and precise retention both during impression taking and in final restorations

for the attenuation of dynamic forces

Pass-through design: Easily accessible through the scanbody for secure tightening

and tissue preservation are of utmost importance

BIONIKA DI UF, Multi-unit abutment, angled, positioned, wide, LT2, type-B Sulcus:s 1 mm ensuring durable and precise retentionBrand characteristics The BIONIKA DI UF implant system is compatible with the DIO UF platform and features an advanced conical connection (Conical Connection) combined with a hexagonal fit, ensuring micromovement free load transfer and exceptional stability. The 22 cone angle directs forces deep into the implant body, reducing cortical bone stress and promoting long term osseointegration. The spirally micro grooved, self locking, and self compressing