LaAlO3, (111) 5x5x0.5 mm substrate, one side Epi polished Thin Film Deposition

LaAlO3, (111) 5x5x0.5 mm substrate, one side Epi polished Thin Film DepositionSubstrate Specifcations: Wafer Size: 5 x 5 x 0. 5 mm thickness + 0. 05 mm, Wafer Orientation: (111) + 0. 5 Deg Polishing: One side CMP polished with free sub surface damaged. Surface finish (RMS or Ra) : < 10A Package: Under 1000 class clean room, and in 100 grade plastic bag in a wafer container. Lattice Constant a=3. 792Pseudo cubic Warning: LaAlO3 crystal has a visible twin on a polished surface, which is normal nature .

KF-D40 Vacuum Bellows - 1 Meter Length for MTI's  high vacuum furnace

constant voltage (CV)

8      7

Polish:           two sides polished

P2O5 20-60%

Effective capacity: 180 ml

for installation of standard sputtering gun ( please click Pic3 & 4 for details )

Activation Energy  0

Roughness:<5A Rms

Brand new laptop with MS Window 10 latest version testing software is installed and calibrated for immediate use (Up to 20 sets of analyzers can be simultaneously controlled by one PC)

Pressing sample by a pressing machine under suitable pressure

KFD25 standard vacuum port to connect a vacuum pump quickly