Al2O3- Sapphire Wafer, R Plane, 2" dia x 0.5mm, 1sp - ALR50D05C1 Convection Oven for installation of standard sputtering

for installation of standard sputtering gun ( please click Pic3 & 4 for details )

Chamber Diameter: 145 mm

and other measurements

2'' and 4'')

Al2O3- Sapphire Wafer, R Plane, 2" dia x 0.5mm, 1sp - ALR50D05C1 Convection Oven for installation of standard sputteringFearures: R plane (1 102) orientation sapphire wafer is being used as a superconductor substrate due to less mis matched lattice and stable chemical and physical properties. Wafer size: 2" dia x 0. 4 0. 5 mm thickness (1 102) Rplane orientation + 0. 5 Deg Polished surface: Wafer surface is EPI polished via a special CMP procedure One side polished Package: Each wafer is packed in 1000 class clean room with 100 grade plastic bag with wafer container