G05200 - SEMI G52 - Test Method for Measurement of Ionic Contamination on Semiconductor Leadframes Revision:SEMI G52-1120 - Current 本書面の範囲は半導体産業で使用する全グレードのDMSOである。

本書面の範囲は半導体産業で使用する全グレードのDMSOである。

Capacity tests are done by adding ppm levels of a given gaseous impurity to a pure zero gas and monitoring the effluent of the test purifier for active impurity species

SEMI E16-90 (Reapproved 0699)

corrosion is not measured directly

G05200 - SEMI G52 - Test Method for Measurement of Ionic Contamination on Semiconductor Leadframes Revision:SEMI G52-1120 - Current 本書面の範囲は半導体産業で使用する全グレードのDMSOである。Contamination on leadframes can contribute to semiconductor device reliability problems. This Test Method may be used by lead frame manufacturers at outgoing inspection and by users at incoming inspection. Correlation of device reliability with contamination levels may lead to improved leadframe cleaning processes. This Standard describes the procedure to determine ionic contamination on leadframes using a water extraction method. The method is