E16300 - SEMI E163 - Guide for the Handling of Reticles and Other Extremely Electrostatic Sensitive (EES) Items Within Specially Designated Areas Revision:SEMI E163-0212 (Reapproved 1217) - Inactive Immunity is specified in terms

Immunity is specified in terms of voltage sag depth (in percent of nominal voltage remaining during the sag) and voltage sag duration (in cycles or seconds)

This Document describes methods for measuring particle contribution from components while using UPW as the test media

Contamination on leadframes can contribute to semiconductor device reliability problems

Trifluoromethane (CHF3) is a colorless

E16300 - SEMI E163 - Guide for the Handling of Reticles and Other Extremely Electrostatic Sensitive (EES) Items Within Specially Designated Areas Revision:SEMI E163-0212 (Reapproved 1217) - Inactive Immunity is specified in termsThe purpose of this Document is to minimize the negative impact on productivity caused by static charge and electric fields in semiconductor manufacturing equipment and facilities. It is a Guide for establishing optimum electrostatic compatibility of the handling environment for reticles and other items that are extremely electrostatic sensitive (EES) to electrostatic charge, voltage, and electric field. This Guide is complementary to SEMI E78 and