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C00327 - SEMI C3.27 - 三フッ化ホウ素(BF3),シリンダ充填, 99.0%品質の仕様 Revision:SEMI C3.27-1102 (Reapproved 1011) - Superseded The primary focus for this
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Description
The primary focus for this Test Method is semiconductor processing equipment including
ESDによる製品,レチクル,装置の損傷を低減する。
This Standard covers 300 mm equipment only
both suppliers and purchasers can uniformly define epitaxial layer quality
C00327 - SEMI C3.27 - 三フッ化ホウ素(BF3),シリンダ充填, 99.0%品質の仕様 Revision:SEMI C3.27-1102 (Reapproved 1011) - Superseded The primary focus for thisglobal Gases Technical Committee2011912global Audits and Reviews Subcommittee201110www. semiviews. org www. semi. org1984200211 : (Si2H6) Referenced SEMI Standards SEMI C1 Specifications for Reagents SEMI C3 Specifications for Gases
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